Researchers from Penn State, Purdue University, Intel Corporation (Santa Clara, CA), The Kurt J. Lesker Company (Jefferson Hills, PA), and National Yang Ming Chiao Tung University in Taiwan have developed a process to produce a "rust-resistant" coating with additional properties ideal for creating faster, more durable electronics. Traditional methods to protect two-dimensional (2D) semiconductor materials from rusting involve oxide-based coatings, but these processes often use water, which can accelerate the oxidation they aim to prevent. The team's approach was to use amorphous boron nitride as a coating material, which was evenly coated on the 2D materials by using a new two-step atomic layer deposition method.
An official website of the United States government.